Welcome to Nitride Semiconductor Laboratory, Low Dimensional Materials Research Centre, University of Malaya. We are one of the research laboratory in Malaysia focusing on III-nitride semicondoctor materials and devices, including epitaxial growth, device design/fabrications and analysis.
The laboratory operates commercial MOCVD from Taiyo Nippon Sanso Corporation for III-nitride-based epitaxy. The laboratory also operates wafer fabrication process tools for 2" and 4" wafers including Photolithography, PE-ALD, ICP, E-Beam & Thermal Evaporation, RTA, and others. Our in-house materials analysis equipment include Rigaku SmartLab HR-XRD, Park NX10 AFM, FEI FESEM, Nanometrics Vertex PL Surface Mapping, Keysight B1505A PDACT, etc.
The laboratory receives grant funding from Ministry of Higher Education Malaysia (MOHE), CREST, as well as donations from multi-national corporations and private sectors.
